Research Area : High-K dielectrics
Office : Engineering Building 5, RM #330
E-Mail : duswl0902@hanyang.ac.kr
Birth date : 2000.09.02
Hanyang University, Ansan, Korea
Research advisor : Professor Ji-Hoon Ahn
B. S. in Department of Materials Science and Chemical Engineering (2019. 03 - 2024. 02)
Hanyang University, Ansan, Korea
3. "Investigating potential use of TiO2 as conductive-like layer in DRAM capacitors"
Applied Surface Science, 720, Part A, 165104 (2026). [link]
Yoonchul Shin, Yeon-Ji Jeon, Ji Hwan Kim, Chan-Bin Hong, Chang Mo Yoon*, Ji-Hoon Ahn*
2. "Effect of increasing deposition temperature of atomic layer deposited ZrO2 thin films: improvement of leakage current properties"
Ceramics International, 51(29), PartC, 61776-61783 (2025). [link]
Ji Hwan Kim, Seung Won Lee, Yoonchul Shin, Yeon-Ji Jeon, Hyo Yeon Kim, Hong Seok Jang, Hyung Soon Park, Tae Joo Park*, Ji-Hoon Ahn*
1. “Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications"
Journal of Alloys and Compounds, 1010 177682 (2025).
Yeon-Ji Jeon, Seung Won Lee, Yoonchul Shin, Ji-Hwan Kim, Chang Mo Yoon, Ji-Hoon Ahn*
The Korean Ceramic Society, Spring Conference (2025), Korea
Yeon-Ji Jeon and Ji-Hoon Ahn*
The 32nd Korean Conference on Semiconductors (KCS 2025), Korea
Yeon-Ji Jeon and Ji-Hoon Ahn*
The Korean International Semiconductor Conference & Exhibition on Manufacturing Technology (KISM 2024), Korea
Yeon-Ji Jeon and Ji-Hoon Ahn*
The 31th Korean Conference in Semiconductors (KCS 2024), Korea
Yeon-Ji Jeon, Seung Won Lee, and Ji-Hoon Ahn*
1. "Optimization of Al-doped HfO2/ZrO2 Layered Structure for Improving Electrical Characteristics" - International
The 7th International Conference on Advanced Electromaterials (ICAE 2023), Korea
Yeon-Ji Jeon, Seung Won Lee, and Ji-Hoon Ahn*