STUDENTS
STUDENTS
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Yoonchul Shin (M.S. & Ph.D. Integrated Course since 2023)
Yoonchul Shin (M.S. & Ph.D. Integrated Course since 2023)
Research Area : High-k dielectrics, Oxide ALD
Office : Engineering Building 5, RM #330
E-Mail : shinyc9782@gmail.com
Birth date : 1997.08.02
Education
Education
M.S. & Ph.D. Integrated Course in Materials Science and Chemical Engineering (2023.03 -)
M.S. & Ph.D. Integrated Course in Materials Science and Chemical Engineering (2023.03 -)
Hanyang University, Ansan, Korea
Research advisor : Professor Ji-Hoon Ahn
B. S. in Department of Mechanical Engineering (2017. 03 - 2023. 02)
Tech University of Korea, Siheung, Korea
Publications
Publications
3. “Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications"
Journal of Alloys and Compounds, 1010 177682 (2025).
Yeon-Ji Jeon, Seung Won Lee, Yoonchul Shin, Ji-Hwan Kim, Chang Mo Yoon, Ji-Hoon Ahn*
2. "Pulse program for improving learning accuracy and reducing programming energy consumption of ferroelectric synaptic transistor"
2. "Pulse program for improving learning accuracy and reducing programming energy consumption of ferroelectric synaptic transistor"
Current Applied Physics, 67 93-100 (2024).
Jae Yeob Lee, Cheol Jun Kim, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Seung Won Lee, Yoonchul Shin, Ji-Hoon Ahn, Bo Soo Kang
1. "Implementation of rutile-TiO2 thin films on TiN without post-annealing through introduction of SnO2 and its improved electrical properties"
Surfaces & Interfaces, 42 Part A 103420 (2023).
Min Ji Jeong, Seung Won Lee, Yoonchul Shin, Jeong-Hun Choi, Ji-Hoon Ahn*
Conferences
Conferences
6. "Study on ALD deposition of MoO2 using new Mo precursor and high-k rutile-TiO2 deposition for DRAM capacitors" - domestic
6. "Study on ALD deposition of MoO2 using new Mo precursor and high-k rutile-TiO2 deposition for DRAM capacitors" - domestic
The Korean Ceramic Society, Spring Conference (2025), Korea
Yoonchul Shin, Jin-Sik Kim, Yun-Kyeong Yi, and Ji-Hoon Ahn*
5. "Possibility of improving electrical properties by using TiO2 deposited by atomic layer deposition as an conductive layer" - Domestic
5. "Possibility of improving electrical properties by using TiO2 deposited by atomic layer deposition as an conductive layer" - Domestic
The 32nd Korean Conference on Semiconductors (KCS 2025), Korea
YoonChul Shin, and Ji-Hoon Ahn*
4. "Enhanced Physical and Electrical Characteristics of SnO2 Thin Films Deposited by Atomic Layer Deposition using Noble Tin Precursor" - Domestic
4. "Enhanced Physical and Electrical Characteristics of SnO2 Thin Films Deposited by Atomic Layer Deposition using Noble Tin Precursor" - Domestic
The Korean Institue of Metals and Materials Spring Conference (KIM 2024 spring), Korea
YoonChul Shin, and Ji-Hoon Ahn*
3. "Optimization for enhanced electrical properties of ZrO2/HfO2 laminated structure for metal-insulator-metal capacitors" - Domestic
The 31th Korean Conference on Semiconductors (KCS 2024), Korea
YoonChul Shin, Seung Won Lee, Ji-Hoon Ahn*
2. "Optimization for enhanced electrical properties of ZrO2/HfO2 laminated structure for metal-insulator-metal capacitors" - International
The Korean International Semiconductor Conference & Exhibition on Manufacturing Technology (KISM 2023), Korea
YoonChul Shin, Seung Won Lee, and Ji-Hoon Ahn*
1. "Enhanced physical and electrical characteristics of SnO2 thin films deposited by Atomic Layer Deposition using Noble Tin Precursor" - International
The Global Conference on Innovation Materials (GCIM 2023), Korea
YoonChul Shin, Min Ji Jeong, Seung Won Lee, and Ji-Hoon Ahn*
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