Research Area : High-K dielectrics
Office : Engineering Building 5, RM #330
E-Mail : giyi0527@gmail.com
Birth date : 1999.05.12
Hanyang University, Ansan, Korea
Research advisor : Professor Ji-Hoon Ahn
B. S. in Department of Materials Science and Chemical Engineering (2018. 03 - 2024. 02)
Hanyang University, Ansan, Korea
1. “Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications"
Journal of Alloys and Compounds, 1010 177682 (2025).
Yeon-Ji Jeon, Seung Won Lee, Yoonchul Shin, Ji-Hwan Kim, Chang Mo Yoon, Ji-Hoon Ahn*
The Korean Ceramic Society, Spring Conference (2025), Korea
Ji Hwan, Seung Won Lee, YoonChul Shin, Yeon-Ji Jeon and Ji-Hoon Ahn*
The 32nd Korean Conference on Semiconductors (KCS 2025), Korea
Ji Hwan, Seung Won Lee, YoonChul Shin, Yeon-Ji Jeon and Ji-Hoon Ahn*
The Korean International Semiconductor Conference & Exhibition on Manufacturing Technology (KISM 2024), Korea
Ji Hwan, Seung Won Lee, YoonChul Shin, Yeon-Ji Jeon and Ji-Hoon Ahn*
The Korean Institue of Metals and Materials Spring Conference (KIM 2024 spring), Korea
Ji Hwan Kim, Yoon Chul Shin, and Ji-Hoon Ahn*
1. "Optimization of process conditions of ZrO2 thin films deposited by atomic layer deposition using a new precursor" - Domestic
The 31th Korean Conference on Semiconductors (KCS 2024), Korea
Ji Hwan Kim, Seung Won Lee, Yoonchul Shin, Yeon-Ji Jeon, and Ji-Hoon Ahn*