STUDENTS
STUDENTS
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Na-Gyeong Kang (M.S. & Ph.D. Integrated Course since 2023)
Na-Gyeong Kang (M.S. & Ph.D. Integrated Course since 2023)
Research Area : Low-resistivity metal ALD
Office : Engineering Building 5, RM #330
E-Mail : nagyeong00@naver.com
Birth date : 2000. 11. 14
Education
Education
M.S. & Ph.D. Integrated Course in Materials Science and Chemical Engineering (2023.03 -)
M.S. & Ph.D. Integrated Course in Materials Science and Chemical Engineering (2023.03 -)
Hanyang University, Ansan, Korea
Research advisor : Professor Ji-Hoon Ahn
B. S. in Department of Materials Science and Chemical Engineering (2019. 03 - 2023. 02)
Hanyang University, Ansan, Korea
Publications
Publications
3. "Effect of H2/N2 ratio on molybdenum nitride thin films deposited by plasma-enhanced atomic layer deposition: Applications for next-generation interconnects"
3. "Effect of H2/N2 ratio on molybdenum nitride thin films deposited by plasma-enhanced atomic layer deposition: Applications for next-generation interconnects"
ACS Applied Nano Materials, 8(25), 13130-13138 (2025).
Min-Ji Ha, Na-Gyeong Kang, Eun-Su Chung, Ji-Hoon Ahn*
2. "Ultrathin metal films with low resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films"
2. "Ultrathin metal films with low resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films"
Chemistry of Materials, 36(17) 8496-8503 (2024).
Na-Gyeong Kang, Min-Ji Ha, Ji-Hoon Ahn*
1. "Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition"
Journal of Vacuum Science & Technology A, 42(4) 042401 (2024).
Min-Ji Ha, Na-Gyeong Kang, Woo-Hee Kim, Tae Joo Park, Tae-Eon Park , Ji-Hoon Ahn*
Patent
Patent
2. "백금계 금속을 포함하는 박막, 및 그 제조 방법"
2. "백금계 금속을 포함하는 박막, 및 그 제조 방법"
10-2024-0057361, Korea
안지훈, 강나경, 하민지
1. "몰리브덴 탄화물을 포함하는 박막, 및 그 제조 방법"
10-2024-0054508, Korea
안지훈, 하민지, 강나경
Conferences
Conferences
4. "Atomic Layer Deposition of Ru Thin Films Using a New Ru precurosr" - Domestic
4. "Atomic Layer Deposition of Ru Thin Films Using a New Ru precurosr" - Domestic
The 32nd Korean Conference in Semiconductors (KCS 2025), Korea
Na-Gyeong Kang, Min-Ji Ha, Eun-Su Chung and Ji-Hoon Ahn*
3. "Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition : Process Pressure Effect on Initial Growth Behavior of Ru Thin Films" - International
3. "Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition : Process Pressure Effect on Initial Growth Behavior of Ru Thin Films" - International
The Korean International Semiconductor Conference & Exhibition on Manufacturing Technology (KISM 2024), Korea
Na-Gyeong Kang, Min-Ji Ha, and Ji-Hoon Ahn*
2. "The Effect of Process Pressure on Improving Resistivity of Ru Thin Films Deposited by Atomic Layer Deposition" - Domestic
2. "The Effect of Process Pressure on Improving Resistivity of Ru Thin Films Deposited by Atomic Layer Deposition" - Domestic
The 31th Korean Conference in Semiconductors (KCS 2024), Korea
Na-Gyeong Kang, Min-Ji Ha, and Ji-Hoon Ahn*
1. "Optimized Electrical Properties of Molybdenum Thin Films Deposited by Atomic Layer Deposition for Next-generation Interconnects" - International
The 7th International Conference on Advanced Electromaterials (ICAE 2023), Korea
Na-Gyeong Kang, Min-Ji Ha, and Ji-Hoon Ahn*
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