STUDENTS

Education

M.S. & Ph.D. Integrated Course in Materials Science and Chemical Engineering  (2020.03 -)

Hanyang University, Ansan, Korea

Research advisor : Professor Ji-Hoon Ahn

B. S. in Department of Materials Science and Chemical Engineering​ (2016. 03 - 2020. 02)

Hanyang University, Ansan, Korea

Publications

6. "Effect of H2/N2 ratio on molybdenum nitride thin films deposited by plasma-enhanced atomic layer deposition: Applications for next-generation interconnects" 

ACS Applied Nano Materials, 8(25), 13130-13138 (2025). 

Min-Ji Ha, Na-Gyeong Kang, Eun-Su Chung, Ji-Hoon Ahn*  

5. "Ultrathin metal films with low  resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films"

Chemistry of Materials, 36(17) 8496-8503 (2024). 

Na-Gyeong Kang, Min-Ji Ha, Ji-Hoon Ahn*

4. "Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition" 

Journal of Vacuum Science & Technology A, 42(4) 042401 (2024).  

Min-Ji Ha, Na-Gyeong Kang,Woo-Hee Kim, Tae Joo Park, Tae-Eon Park , Ji-Hoon Ahn*  

3. "Low-temperature growth of 2D-MoS2 thin films by plasma-enhanced atomic layer deposition using a new molybdenum precursor and applicability to gas      sensors" 

ACS Applied Nano Materials, 6(13) 12132-12139 (2023).   

Jeong-Hun Choi, Min-Ji Ha, Dong Geun Kim, Ji-Min Lee,  Ji-Hoon Ahn   

2. "Ultra-low resistivity molybdenum carbide thin films deposited by plasma-enhanced atomic layer deposition using a cyclopentadienyl-based precursor"

Chemistry of Materials, 34(6), 2576-2584  (2022).  

Min-Ji Ha, Hyunchang Kim, Jeong-Hun Choi, Miso Kim, Woo-Hee Kim, Tae Joo Park, Bonggeun Shong*, Ji-Hoon Ahn* 

1. "A strategy for wafer-scale crystalline MoS2 thin films with controlled morphology using pulsed metal-organic chemical vapor deposition at low temperature"

Advanced Materials Interfaces, 9(4) 2101785 (2022).   

Jeong-Hun Choi, Min-Ji Ha, Jae Chan Park, Tae Joo Park, Woo-Hee Kim, Myoung-Jae Lee, Ji-Hoon Ahn*  

Patent

2. "백금계 금속을 포함하는 박막, 및 그 제조 방법"

10-2024-0057361, Korea 

안지훈, 강나경, 하민지  

1. "몰리브덴 탄화물을 포함하는 박막, 및 그 제조 방법" 

10-2024-0054508, Korea   

안지훈, 하민지, 강나경 

Conferences

9. "Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction" - Domestic

The 32nd Korean Conference on Semiconductors (KCS 2025), Korea  

Min-Ji Ha, Na-Gyeong Kang, and Ji-Hoon Ahn* 

8. "Low-resistivity Molybdenum Nitride Thin Films Deposited by Atomic Layer Deposition for Cu diffusion barrier" - International

The  MRS Spring Meeting & Exhibit, Spring Conference (MRS 2023), USA  

Min-Ji Ha, Jeong-Hun Choi, Na-Gyeong Kang, and Ji-Hoon Ahn* 

7. "Ultra-Low Resistivity Mo2C Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Novel Precursor" - Domestic

The 30th Korean Conference in Semiconductors (KCS 2023), Korea  

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*  

6. "원자층증착법에 의해 증착된 저저항 질화몰리브덴 박막" - Domestic

The Korean Institute of Surface Engineering, Fall Conference (KISE 2022) , Korea 

 Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*  

5. "Ultra-low Resistivity Molybdenum Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-based Precursor" - International

The 22nd International Conference on Atomic Layer Deposition (ALD 2022), Belgium 

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*  

4. "Ultra-low Resistivity Molybdenum Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-based Precursor" - Domestic

The Materials Research Society of Korea, Spring Conference (MRS 2022), Korea  

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*

3. "Ultra-Low Resistivity Mo2C Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Novel precursor" - Domestic

The 29th Korean Conference in Semiconductors (KCS 2022), Korea  

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn* 

2. "Low-resistivity Molybdenum Carbide Thin Films Deposited by Atomic Layer Deposition Using a New Precursor" - International

The 6th International Conference on Advanced Electromaterials (ICAE 2021), Korea 

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*

1. "Low-resistivity Molybdenum Nitride Thin Films Deposited by Atomic Layer Deposition Using a New Precursor" - Domestic

The 28th Korean Conference on Semiconductors (KCS 2021), Korea 

Min-Ji Ha, Jeong-Hun Choi, and Ji-Hoon Ahn*