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게시일: 2018. 8. 2 오전 2:28:42
New paper, entitled "Silicon atomic layer etching by two-step plasma process consisting of oxidation and modification to form (NH4)2SiF6, and its sublimation" has been accepted to Japanese Journal of Applied Physics.
New paper, entitled "Silicon atomic layer etching by two-step plasma process consisting of oxidation and modification to form (NH4)2SiF6, and its sublimation" has been accepted to Japanese Journal of Applied Physics.
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