NOLTA

Post date: Sep 10, 2013 10:08:53 PM

Multiscale Surface Roughness Measure for Dressed-Photon-Phonon Etching

Makoto Naruse1, Takashi Yatsui2, Wataru Nomura2,

Tadashi Kawazoe2, Masaki Aida3, and Motoichi Ohtsu2

1 Photonic Network Research Institute, National Institute of Information and Communications Technology, Tokyo, Japan

2 Department of Electrical Engineering and Information Systems / Nanophotonics Research Center, School of Engineering, The University of Tokyo, Tokyo, Japan

3 Tokyo Metropolitan University, Tokyo, Japan

Proceedings of the 2013 International Symposium on Nonlinear Theory and its Applications (NOLTA2013)

pp. 499-502

2013.9.11, Santa Fe

Abstract:

Dressed-photon-phonon (DPP) etching is a disruptive technology in planarizing material surfaces because it completely eliminates mechanical contact processes. However, adequate metrics for evaluating the surface roughness and the underlying physical mechanisms are still not well understood. Here we propose a two-dimensional multiscale surface roughness measure that represents the effectiveness of DPP etching while conserving the original two-dimensional surface topology. Also, we created a simple physical model of DPP etching that agrees well with the experimental observations, which clearly shows the involvement of the intrinsic multiscale properties of dressed photons, or optical near-fields, in the surface processing.

http://www-lab23.kuee.kyoto-u.ac.jp/nolta2013/