MOSFET
As part of a Solid State Processing and Integrated circuits Laboratory, I fabricated this MOSFET at USC EE Fablab using a KrF (248 nm) excimer laser. As part of my research to characterize aluminum/aluminum oxide material surfaces, I was trying to understand both the theoretical modeling and Silicon oxide growth processes that are involved with fabricating a MOSFET. Based on this experience, we explored various techniques that could be used to model, characterize and synthesize oxide layer thickness on our EUV aluminum filters.