Instrumentation

The research on bulk and thin films materials at Mele Lab is carried on by means of instrumentation available at the Lab in Sentanken building, Omiya campus of Shibaura Institute of Technology, and Technoplaza.

Instrumentation in room 106

PLD system: laser

Nd:YAG LASER PLAD-241 (LOTIS TII)This compact laser source is used to ablate dense targets inside the two chambers and produce thin films

PLD system: vacuum chamber 1

This chamber (ULVAC) is bigger and partially automatized. It is currently dedicated to the deposition of skutterudite thin films

PLD system: vacuum chamber 2

This chamber (customized) is smaller and for completely manual use. It is currently dedicated to the deposition of oxide thin films

Tubular furnace

AS-ONE TMF-700N (200 V), TMAX = 1000 C, equipped with alumina tube. - Used for cleaning the substrates before thin films deposition

Diamond saw

The saw (Buehler IsoMet 1000) is used for precise cutting of glass or single crystal substrates in the desired shape before PLD deposition

Room-T Seebeck meter

The Seebeck probe (Joule Yacht PTM-3) allows to measure the Seebeck coefficient of thin films or bulk materials at room temperature

Instrumentation in room 303-1

MOD system: spin coater

The spin coater (Kyowariken K-359S1) is dedicated to the deposition of MOD organic layers on 1 cm^2 substrates at room T

MOD system: firing furnace

AS-ONE TMF-700N (200 V), TMAX = 1000 C, equipped with quartz tube and flanges. For firing of MOD layers up to 1000 C under vacuum or different atmospheres (Ar, Ar + 1% H2, O2, air)

Annealing furnace

AS-ONE TMF-500N (100 V), TMAX = 1000 C, equipped with quartz tube and flanges, for annealing of thin films up to 1000 C under vacuum or different atmospheres (Ar, Ar + 1% H2, O2, air)

Resistivity and Seebeck evaluation system

Under construction

Thermoelectric module power evaluation system

Home made system for completely manual use. Allows to evaluate the output power of bulk or thin film modules up to about 400 C.

Muffle furnace

The muffle (Nitto Kagaku) is used to carry on solid state reactions or conventional sintering up to 1200 C

Torch

The torch sealer kit (Asada R35780) is based on propane-oxygen mixture and allows to seal quartz tubes in vacuum

Dry stove

The stove (ETTAS EOP 300B) is used for complete drying of quartz tubes before sealing or other procedures requiring water evaporation

Gold sputter

The sputter (Tokyo Electron Quick Coater Sc-701 Mk II) is used to deposit gold electrodes on devices

Shared instrumentation in room 303-1

SPS

The SPS (spark plasma sintering) unit (SinterLand Labox) is used for rapid sintering of dense pellets - Requires reservation under technoplaza system

Some other shared instrumentation is available at Technoplaza - Toyosu campus (SEM) and Omiya campus (XRD) and it is routinely used.

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