Facilities
We work with equipment available in the Superconductivity lab
&
in the Common labs of the School of Physical Sciences at NISER
Film growth
Facilities
4-Target DC sputter system: Metallic multilayers (DST Funded)
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E-beam evaporation system: Metallic layers / angular deposition
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RF sputtering system: Device isolation oxide (SiO2)
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Langmuir-Blodgett system: Polymer monolayers
Device processing
(Clean room facility)
UV mask aligner (Common Labs) MIDAS - MDA400
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Direct Maskless writer (Common Labs) Heidelberg - uMLA
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Focused Ion beam (Common Labs) Zeiss - Crossbeam340
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Reactive Ion Etching (Common Labs) for CF4 chemistry
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Ion milling and in-situ metallization (Common Labs) coming soon...
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FESEM System (Common Labs) Zeiss Sigma
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Step profiler (Common Labs) Bruker Dektak XT
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Wire Bonder (Common Labs) TPT-BH05
Low temperature Measurements
Liquid free 2K Cryogenic measurement system (DC transport and VSM)
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Liquid Helium Research Dewar Cryo Industries
