Massively Parallel 3D Nanolithography Using a Metalens Array
High-volume, rapid fabrication of 3D nano-architected materials and devices is key to deploying next-generation nanotechnologies to solve real-world challenges. Due to the field-of-view limitations of conventional optics, existing maskless 3D nanofabrication techniques face fundamental challenges in throughput, proximity error, and stitching defects. We present a scalable 3D nanofabrication platform that utilizes a metalens-generated focal spots array to massively parallelize two-photon lithography (TPL). Our metalens TPL system uses over 120,000 metalenses to enable the rapid parallel production of complex nanostructures with nanoscale resolution (up to 113 nm) over a 12 cm2 write field. By programmatically patterning the focal spot array using a spatial light modulator, we further devise an adaptive parallel printing strategy for precise grayscale linewidth modulation and high-throughput production of semi-periodic and fully aperiodic 3D geometries. We envision the future of 3D nanolithography as massively parallel, swiftly adaptive, and computationally agile, enabling transformative applications in microelectronics, fusion energy, quantum technology, biomedicine, and beyond.