Research

Research Interests

• Research and development of new CMP slurries and Post-CMP cleaning solutions for copper, tungsten, cobalt, oxide, STI, and barrier metal layers.

• Colloidal Chemistry and Electrochemistry

• Nanoparticle synthesis and dispersion

• Particle adhesion and removal

• Atomic force microscopy & Evanescent Wave Microscopy

Chemical Mechanical Planarization