Equipment

AJA Magnetron Sputtering System

* 7 confocal magnetron sputtering guns allowing uniform deposition over 4" wafer and co-sputtering

* Biult-in Kaufmann ion source for ion beam etching

* In-situ mask indexing system allowing deposition of different stacks on multiple samples in one load

* Load-lock transfer

Magneto-Optic-Kerr-Effect-based Spin-Orbit Torque Meaurement System

* Electromagnet with magnetic field up to 5 KG

* Stable 785 nm Laser Power up to 100 mW

* Near 1000:1 SNR for measuring damping-like spin-orbit torque in a Py(3nm)/Pt(5nm) test sample

Probe Station with 5-axis Magnets

* 5-axis electromagnet with tunable magnetic fields in x-, y- and z- directions up to 1 kG

* Four DC probes. Currently good for measuring transport behaviors such as giant magnetoresistance, anisotropic magnetoresistance, and anomalous Hall effect.

* Can measure second harmonics to extrapolate

Magneto-thermo-electric Measurement System

* Electromagnet with magnetic field up to 10 kG

* Precise control of heat flow and temperature

* Nanovolt resolution after averaging

Ferromagnetic Resonance and Spin Pumping System

* Agilent 8720B Network analyzer (130 MHz - 20 GHz)

* Electromagnet with magnetic field up to 10 KG

* Broadband coplanar waveguide for flip-chip FMR measurement

* Varian X-band TE102 resonant cavity (Courtesy of Prof. Eaton)

* Sample holder with 3D motion stage

Photolithography System with Home-built Mask Aligner

* Uses 2" x 2" mask with writing field of about 1.5" x 1.5"

* Minimum alignment step size of 5 um.

* Can carry out both positive and negative photolithography