Facilities
On-site equipment
On-site equipment
Sample growth
Sputter 01: Mid-vacuum sputter system for metal and dielectric deposition
Sputter 02: High-vacuum sputter system for semiconductor deposition
CVD: Triple-heater zone thermal chemical vapor deposition reactor
Molecular beam epitaxy (MBE) system
Process and measurement
RT and LT (77 K) Hall effect measurement system
Order-made spectrometer in VIS-NIR range
Spin coater
Shared equipment
Shared equipment
Electron-beam evaporator (Shared equipment of Prof. Yoon Kyeung Lee https://0simlee.wixsite.com/mysite)
Atomic layer deposition (Shared equipment of Prof. Ki-Tae Lee (https://top.jbnu.ac.kr/fceml)