Materials Analysis
Optical Microscope (Nikon L200N)
Magnification : 50X ~ 1000X
Stage : L2-S8A 8*8 stage
Illumination : Koehler system
Filters : FILTER 25 NCB FOR L200 (EPI/DIA)
Base : L200N STAND 100/240V
Objectives chromatic aberration free lens
C-MOS digital camera
Focused Ion Beam (Helios NanoLab 450)
Electron optics - Resolution
- HV : 0.9 nm @15 kV, 1.4 nm @1 kV
- Accelerating voltage : 1 kV ~ 30 kV
- Probe current : up to 200 nA
- Magnification : 30 x ~ 1,280 kx
Ion optics - Resolution : 5 nm @30 kV
- Beam voltage : 500 V - 30 kV
- Multi chem gas injection systems (C, Pt, W, H2O)
Transmission Electron Microscope (Titan cube G2 60-300)
Acceleration voltage : 60 - 300 kV
Lattice resolution : 0.065 nm
BF-STEM resolution : 0.14 nm
HAADF-STEM resolution : 0.12 nm
Probe stability : 1 nm/min or less
Stage stability : 1 nm/min or less
EDS resolution : 128 eV
EELS resolution : 0.16 eV
Contamination : 1 nm/min or less
Transmission Electron Microscope (JEOL ARM 300)
Acceleration voltage : 80 - 300 kV
Lattice resolution : 0.05 nm
BF-STEM resolution : 0.063 nm
HAADF-STEM resolution : 0.063 nm
EDS resolution : 127 eV
EELS resolution : 0.3 eV (at 300kV)