Alumni
Alumni
Windu Sari
M.S. (2010.02.)
Thesis : A study on the atomic layer deposition (ALD) of Ru thin film as a seed layer for copper metallizations
Current position
Tae-Kwang Eom
M.S. (2010.08.)
Thesis : Ru-Si-N Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for the Direct Plating of Cu
Current position : R&D Manager, TaeguTec
Taeho Kim
M.S. (2011.08.)
Thesis : A Study on Plasma-Enhanced Atomic Layer Deposition of TaCx Films and Applications to a Metal Gate and Diffusion Barrier for Cu Metallization
Current position : Process Engineer 4, Lam research Korea
Taehoon Cheon
Ph.D. (2023.02) / M.S. (2011.08.)
Thesis : Atomic Layer Deposition of Novel Ru-Al-O Thin Films for Seedless Copper Electroplating Application / Advanced Transmission Electron Microscopy (TEM) Study on Atomic Layer Deposited Ru-based thin films for Future Metallization
Current position : Specialized Technician, Daegu Gyeongbuk Institute of Science and Technology
Sang-Hyuk Choi
M.S. (2011.08.)
Thesis : A study on atomic layer deposition (ALD) of Ru thin films using novel Ru(0) metallorganic precursor
Current position : Principal Researcher, Ceratrak
Kiyeung Mun
M.S. (2012.02.)
Thesis : A study on plasma-enhanced atomic layer deposition of Ru thin film using N2/H2 plasma as a reactant
Current position : Senior Research Engineer, Hansol chemical
Sang-Kyung Choi
M.S. (2013.02.)
Thesis : A study on plasma-enhanced atomic layer deposition Formation of TiCx/TiNx thin film and metal gate and Research on application to copper diffusion barrier
Current position : Account Manager, Thermofisher Scientific
Seungmin Yeo
M.S. (2013.02.)
Thesis : A study on atomic layer deposition of Ru thin films using novel Ru(0) metallorganic precursors as a seed layer for copper mettalizations
Current position : Process Enginee, Jusung Engineering
Ji-Yoon Park
M.S. (2013.02.)
Thesis : A study on atomic layer deposition of ruthenium-oxide thin films and application of bottom electrode with high-permittivity dielectric
Current position : Manager, 3RT
Jae Hoon Jung
M.S. (2014.08.)
Thesis : Highly Conformal Amorphous W-Si-N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
Current position : Technical Service Engineer, Wonik IPS
Han Gil Kim
M.S. (2015.02.)
Thesis :A Study on thr Atomic Layer Deposition (ALD) of p-type Copper(I) Oxide Cu2O Thin Films and Application of p-Cu2O/n-Si Nanowire Photodiode
Current position : Application Engineer, KLA
Seungjoon Lee
M.S. (2015.02.)
Thesis : A study on thermal atomic layer deposition of Ruthenium(Ru) thin films using a new Ru metallorganic precursor and non-oxidizing reactant
Current position : Specialist, LG Innotek
Yujin Jang
M.S. (2015.08.)
Thesis :A Study on the growth of molybdenum-based thin films using atomic layer deposition
Current position : Researcher, Korea Basic Science Institute
Hyun Jung Lee
M.S. (2016.02.)
Thesis : Plasma Enhanced Atomic Layer Deposition of Ru-Mn Thin Films as a diffusion layer for the Direct Plating of Cu
Current position : Technical Engineer, Daegu Gyeongbuk Institute of Science and Technology
Min Young Lee
M.S. (2016.02.)
Thesis : Ruthenium thin films by thermal atomic layer deposition using new zero valent Ru precursors as a seed layer for copper
Current position : Researcher, Daegu Gyeongbuk Institute of Science and Technology
Jun-Beom Kim
M.S. (2016.02.)
Thesis : A controlled growth of tungsten-based thin films prepared by atomic layer deposition
Current position : Senior Researcher
Byeong Hyeon Jang
M.S. (2016.08.)
Thesis : A study on atomic layer deposition of high-quality tin monosulfide film as an absorber layer for solar cell device
Current position : Customer Support & application scientist, Oxford Instruments
Soonyoung Jung
M.S. (2017.02.)
Thesis : Controlled growth of cobalt oxide thin films by atomic layer deposition for catalyst of water splitting
Current position : Director of Research, Ecobean
Shunichi Nabeya
M.S. (2019.02.)
Thesis : Atomic layer deposition of nickel and nickel-based alloy thin films using non-oxidizing reactant
Current position : Manager, TATANAKA Precious Metal, Japan
Tae Hyun Kim
M.S. (2019.02.)
Thesis : Atomic layer deposition of MoNx thin film and its application into diffusion barrier against Cu and the catalyst for water splitting
Current position : Ph.D. student in yonsei university
Seungmin Han
M.S. (2020.02.)
Thesis : Study on atomic layer deposition of high-quality platinum thin films using a new Pt metal-organic precursor
Current position : Research Associate, Air Liquide
Yong Hwan Joo
M.S. (2020.02.)
Thesis : Study on low resistivity molybdenum nitride thin films prepared plasma enhanced atomic layer deposition and effect of post annealing
Current position : Associate Researcher, Korea Intelligent Automotive parts promotion Institute
Deokhyun Kim
M.S. (2020.08.)
Thesis : Atomic layer deposition of WSx thin films using Tungsten tris(3-hexyne) carbonyl and H2S and the effects of post-annealing on their properties
Current position : Researcher, Soulbrain
Na-Yeon Park
M.S. (2021.02.)
Thesis : A study on atomic layer deposition of Iridium thin films using a new metal-organic precursor for water splitting application
Current position : Process Engineer, SAMSUNG ELECTRONICS
Jin Hyeok Lee
M.S. (2021.02.)
Thesis : A study on atomic layer deposition of tungsten-based thin films using a new fluorine-free W precursor and several reactants
Current position : Researcher, KOMICO
Ansari Mohd Zahid
Ph.D. (2021.05.)
Thesis : Low temperature atomic layer deposition of tin sulfide and nitride thin films towards energy storage applications
Current position : Research Professor, MSE, Yeungnam University
Youn Hye Kim
M.S. (2022.02.)
Thesis : Atomic layer deposition of RuO2 using a new metal-organic precursor as a diffusion barrier for Ru interconnect
Current position : Process Engineer, SAMSUNG ELECTRONICS
Kang-Min Seo
M.S. (2022.08.)
Thesis : Plasma-enhanced atomic layer deposition of tungsten nitride thin film using a fluorine-free W precursor, WCl5
Current position : Reseracher, Soulbrain