Viktor Shapovalov
Personal Data
Name Viktor Ivanovich Shapovalov
Date and place of birth 15th June 1944, Chita, USSR
Citizenship Russia
Language Russian and English
Family Wife, three children, and five grandsons
Work address ul. Professora Popova 5, 197022 St. Petersburg, Russian Federation
Phone and e-mail +7 (921) 339 94 85 vishapovalov@mail.ru
Academic Qualification
Degree: Diploma of Electrical Engineer (equivalent to the M.S. degree in electrical engineering)
Place and Date: Radiotechnic Department, Institute of Electrical Engineering, Leningrad, 1968
Thesis Title: “Divice for Medical measurements”
Degree: Candidate of Engineering Science (equivalent to the Ph.D. degree in physics)
Place and Date: Radiotechnic Department, Institute of Electrical Engineering, Leningrad, 1973
Dissertation Title: “Research of reliability of electronic components”
Degree: Doctor of Science in Engineering
Place and Date: Electronics Department, Saint-Petersburg Electrotechnical University, Saint-Petersburg, 2008
Dissertation Title: “Film structures of oxides of transitive metals: technology, the control, the equipment”
Academic Position
1968 – 1970 Engineer, Department of Radio equipment of the ships, Institute of Electrical Engineering, Leningrad
1971 – 1973 Post-graduate student, Department of Special the electrical engineer, Institute of Electrical Engineering, Leningrad
1974 – 1975 Researcher, Department of Electron - Ion Processing of Solids, Institute of Electrical Engineering, Leningrad
1976 – 1978 Senior Researcher, Department of Electron - Ion Processing of Solids, Institute of Electrical Engineering, Leningrad
1979 – 2009 Associate Professor, Electronics Department, Saint-Petersburg Electrotechnical University, Saint-Petersburg (formerly Institute of Electrical Engineering, Leningrad)
2010 – present Professor, Electronics Department, Saint-Petersburg Electrotechnical University, Saint-Petersburg
Research Fields (for publications see List of Main Publications)
1968 – 1982 Engineering Cybernetics. Statistical methods: dispersive analysis, regression analysis, the
theory of planning of experiment, reliability of electronic components.
1983 – 2003 Interaction of ionic beams with a material: physical and technological aspects, thin films.
1984 – present Thin film technology. Resistive evaporation, Evaporation by an electronic beam, Magnetron
sputtering, Reactive sputtering
2004 – present Film structures of oxides of transitive metals: technology, the control, the equipment.
List of Main Publications
1. Books and Review Papers
1. Small sample, Statistica, Moscow, 1978 (248 pages, Ch. 6 by co-author D.V. Gaskarov, in Russian).
2. Film of oxides of transitive metals: physics and technology of reactive sputtering, St.-Petersb. Electrotech.
Univ., Saint-Petersburg, 2009 (176 pages, by co-author A.A. Barybin, in Russian).
3. Physico-technological bases macro-, micro-and nanoelectronics. Mockow.: Fizmatlit, 2011. (784 pages, by co-
author Barybin A.A., Tomilin V.I., in Russian).
4. Nanopowders and Films of Titanium Oxide for Photocatalysis: A Review // Glass Phys.Chem. 2010, Vol. 36,
No 2, P. 121–157.
5. Tungsten oxide film: Technology, Properties and application. St.-Petersb. Electrotech. Univ., Saint-
Petersburg, 2014. (118 pages, in Russian).
6. High-power sputtering. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2016. (151pages, in Russian).
7. Oxinitride films. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2017 (200 pages, in Russian).
8. Magnetron with hot target. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2019. (220 pages, in Russian).
9. Films of nitrides. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2020 160 p. (co-authors E.A. Minzhulina, A.A. Kozin, V.V. Smirnov, in Russian)
10. Plasma Technologies for Surface Modification, Synthesis of Nanomaterials and Use in Hydrogen Energy, Ed. prof. V. I. Shapovalov. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2020. 395 p. (authors D. A. Karpov, V. N. Litunovsky, in Russian).
2. Textbooks
1. A.A. Dakhnovich, V. I. Shapovalov, The analysis of quality of logic integrated circuits. Methodical instructions to laboratory works. Inst. Electrotech. Engng., Leningrad, 1979 (32 pages, in Russian).
2. A.A. Dakhnovich, V. I. Shapovalov, Methodical instructions to course work "Optimization of technological processes". Modelling in technology of electronic devices. Inst. Electrotech. Engng., Leningrad, 1981 (40 pages, in Russian).
3. V. I. Shapovalov, The control of technological processes over manufacture of integrated circuits. The text of lectures. Inst. Electrotech. Engng., Leningrad, 1982 (49 pages, in Russian).
4. A.A. Dakhnovich, V. I. Shapovalov, Methodical instructions to course work "Optimization of technological processes" Optimization of modes of technological process. Inst. Electrotech. Engng., Leningrad, 1983 (32 pages, in Russian).
5. A.A. Dakhnovich, V. I. Shapovalov, Methodical instructions to course work on discipline «Electron Devices Technology». The statistical analysis of technology of electronic devices. Inst. Electrotech. Engng., Leningrad, 1985 (45 pages, in Russian).
6. V. I. Shapovalov, The control of technological processes over microelectronics. The text of lectures. Inst. Electrotech. Engng., Leningrad, 1985 (45 pages, in Russian).
7. Laboratory Works on Electron Devices Technology, A. A. Barybin (editor), Inst. Electrotech. Engng., Leningrad, 1986 (79 pages, in Russian).
8. V. I. Shapovalov, V. Novic, K. Khalzer Methodical instructions on studying discipline «Electron Devices Technology». Bases of vacuum technical equipment. Inst. Electrotech. Engng., Leningrad, 1989 (32 pages, in Russian).
9. A.A. Barybin and V. I. Shapovalov, Control of Phase and Chemical Conversions for Technological Processes.
The text of lectures. Inst. Electrotech. Engng., Leningrad, 1989 (46 pages, in Russian).
10. N.V. Kachan, M. K. Kovaleva, L.E. Romadina, V. I. Shapovalov, Methodical instructions to an academic year
project "Electron Devices Technology". Inst. Electrotech. Engng., Leningrad, 1990 (32 pages, in Russian)
11. A.A. Barybin and V. I. Shapovalov Control of Structural Conversions in Materials; Kinetic and Diffusion
Processes. The text of lectures. Inst. Electrotech. Engng., Leningrad, 1991 (48 pages, in Russian).
12. A.A. Barybin, U. V. Gromova, M. K. Kovaleva, and V. I. Shapovalov, Methodical Instructions for Practical
Works on Electron Devices Technology, Inst. Electrotech. Engng., Leningrad, 1991 (32 pages, in Russian).
13. N.V. Kachan, L.E. Romadina, V. I. Shapovalov, Methodical instructions on course designing on discipline "
Electron Devices Technology ". St.-Petersb. Electrotech. Univ., Saint-Petersburg, 1994 (32 pages, in Russian).
14. Laboratory practical work at the rate «Materials and Electron Devices Technology». V. I. Shapovalov
(editor). St.-Petersb. Electrotech. Univ., Saint-Petersburg, 1995 (52 pages, in Russian).
15. A.A. Barybin and V. I. Shapovalov, Surface Phenomena and Interphase Processes. The text of lectures. St.-
Petersb. Electrotech. Univ., Saint-Petersburg, 2000 (48 pages, in Russian).
16. Models of technological process: Methodical instructions to laboratory works on discipline "Materials and
Electron Devices Technology”. V. I. Shapovalov (editor). St.-Petersb. Electrotech. Univ., Saint-Petersburg,
2000 (32 pages, in Russian).
17. Technology of products of electronics: Methodical instructions to laboratory researches on discipline
"Materials and Electron Devices Technology ". V. I. Shapovalov (editor). St.-Petersb. Electrotech. Univ.,
Saint-Petersburg, 2001 (48 pages, in Russian).
18. V. I. Shapovalov, Modes of technological processes. The text of lectures. St.-Petersb. Electrotech. Univ., Saint-
Petersburg, 2001 (63 pages, in Russian).
19. A.V. Tumarkun, V. I. Shapovalov, Thin Films Technology. The text of lectures. St.-Petersb. Electrotech. Univ.,
Saint-Petersburg, 2003 (64 pages, in Russian).
20. Virtual laboratory: Methodical instructions to laboratory works on discipline «Materials and Electron Devices
Technology». V. I. Shapovalov (editor). St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2003 (32 pages, in
Russian).
21. V. I. Shapovalov, Nanotechnology of films and structures. The text of lectures. St.-Petersb. Electrotech. Univ.,
Saint-Petersburg, 2007 (80 pages, in Russian).
22. V. I. Shapovalov, Bases of physics of technological environments. The text of lectures. St.-Petersb. Electrotech.
Univ., Saint-Petersburg, 2009 (96 pages, in Russian).
23. Electron Devices Technology. Manual to laboratory works V. I. Shapovalov (editor). St.-Petersb. Electrotech.
Univ., Saint-Petersburg, 2010 (96 pages, in Russian).
24. A. E. Komlev, V. I. Shapovalov Thermodynamic principles of technology. The text of lectures. St.-Petersb.
Electrotech. Univ., Saint-Petersburg, 2013 (67 pages, in Russian).
25. A. E. Komlev, V. I. Shapovalov Technological problems: electronic textbook St.-Petersb. Electrotech. Univ.,
Saint-Petersburg, 2013 (132 pages, in Russian).
26. V. I. Shapovalov Fundamentals of vacuum and plasma technology. Part 1: The text of lectures. St.-Petersb.
Electrotech. Univ., Saint-Petersburg, 2015 (84 pages, in Russian).
27. V. I. Shapovalov Fundamentals of vacuum and plasma technology. Part 2: The text of lectures. St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2016 (84 pages, in Russian).
28. Shapovalov V.I. Technology of advanced materials / Ed. Shapovalova V.I.: Educational and methodological manual for laboratory classes in the disciplines "Technologies of advanced materials for electronics and radio photonics" and "Technologies for advanced materials for electronics"; St.-Petersb. Electrotech. Univ., Saint-Petersburg, 2019. 110 p. (co-authors A.A. Kozin, in Russian).
3. Papers
1. V. A. Zhabrev, Yu.A. Bystrov, L.P. Efimenko, A.E. Komlev, V.G. Baryshnikov, A.A. Kolomitsev, V.I. Shapovalov. The effect of thermal treatment on the structure of tantalum oxide films grown on titanium // Technical Phys. Lett. – V. 30. – 2004. No 5, – P. 396–398.
2. A.A. Barybin, A.V. Mezenov, V.I. Shapovalov. Determining the optical constants of thin oxide films // J. Opt. Technol. – 2006, – V. 73, N. 8. – P. 548–554.
3. A.A. Barybin, Yu.A. Bystrov, A.E. Komlev, A.V. Mezenov, V.I. Shapovalov. Frequency dispersion of tantalum oxide films // Technical Phys. Lett. – V. 32. – 2006. No 1, – P. 79–81.
4. A. A. Barybin, V.I. Shapovalov. Nonisothermal chemical model of reactive sputtering // J. Appl. Phys. – 2007.
– V. 101. – P.054905-1–10.
5. A. A.Barybin, V. I. Shapovalov. Charge Relaxation in Conducting Dielectric Films with Shallow and Deep
Traps Phys. Solid State, – 2008, – V. 50, No 5, – P. 815–827.
6. V.I. Shapovalov, L. P. Efimenko, A. E. Komlev [et. al]. Change in the optical properties of amorphous films of
transition metal oxides upon formation of the nanocrystalline phase // Glass Phys. Chem. – 2009. – V. 35, No.
6. – P. 620–626.
7. V. I.Shapovalov. Nanopowders and Films of Titanium Oxide for Photocatalysis:A Review // Glass Phys.Chem.
2010, Vol. 36, No 2, P. 121–157.
8. A. E. Komlev, A. E. Lapshin, O. V. Magdysyuk, V. V. Plotnikov, V. I. Shapovalov, N. S. Shutova. Effect of
Heat Treatment on the Structure of Titanium Dioxide Films // Techn. Phys. Lett. 2010, V. 36, No. 10, P. 942–
944.
9. A. A. Barybin, V. I. Shapovalov. Differential Equation for the Melting Temperature of Small_Size Particles //
Techn. Phys. Lett. – 2010. V. 36, No. 11. P. 1058–1060.
10. A. A. Barybin, V. I. Shapovalov. Substrate effect on the optical reflectance and transmittance of thin-film
structures // Inter. J. Opt. 2010. V. 2010. Article ID 137572, 18 pages, doi:10.1155/2010/137572.
11. A. A. Babybin, V. I. Shapovalov. Modification of Pawlow’s thermodynamical model for the melting of small
single-component particles // J. Appl. Phys. 2011. V. 109. P. 034303(1–9) doi:10.1063/1.3544468.
12. V.I. Shapovalov, O.A. Shilova, I.V. Smirnova, A.V. [et al.]. Modification of the Glass Surface by Titanium
Dioxide Films Synthesized through the Sol–Gel Method / // Glass Phys.Chem. 2011, V. 37, No. 2, P. 150–156.
13. Zav’yalov A.V., Shapovalov V.I., Shutova N.S. Kinetics of Internal Photoeffect in Titanium Dioxide Films //
Techn. Phys. Lett. 2011, V. 37, No.11, P. 1008–1010, DOI: 10.1134/S1063785011110162.
14. Barybin A.A., Zav’yalov A.V., Shapovalov V.I. Effect of Surface Traps on Relaxation of Injected Charge in
Dielectric Films // Phys. Sol. State, 2012. V. 54, No. 1. P. 53–61.
15. Shapovalov V.I., Lapshin A.E., Komlev A.E., Komlev A.A. Crystallization and Thermochromism in Tungsten
Oxide Films Annealed in Vacuum // Techn. Phys. Lett. 2012. V. 38, No. 6. P. 555–558.
16. Barybin A. A., Zavyalov A. V., Shapovalov V. I. A Nonisothermal Physicochemical Model of Synthesis of
Oxyinitrides by Reactive Sputtering Techniques // Glass Phys. Chem. 2012. V. 38, No. 4. P. 396–401.
17. Komlev A. E., Shapovalov V. I., Shutova N. S. Magnetron Discharge in an Argon–Oxygen Mixture for
Deposition of a Titanium Oxide Film // Techn. Phys.. 2012. V. 57, No. 7. P. 1030–1033.
18. Shapovalov V.I., Lapshin A.E., Komlev A.E., Arsent’ev M.Yu., Komlev A.A. Crystallization and
Thermochromism of Annealed Heterostructures Containing Titanium and Tungsten Oxide Films // Technic.
Phys. 2013, V. 58, No. 9. P. 1313–1322. DOI 10.1134/S1063784213090247.
19. Lapshin A.E., Shapovalov V.I., Komlev A.E., Arsent’ev M Yu., Komlev A. A. Effect of Heat Treatment on
Phase Composition and Spectral Properties of Heterostructures Containing Titanium and Tungsten Oxide
Films // Glass Phys. Chem. 2013. V. 39. No. 5. P. 563–569. DOI 10.1134/S1087659613050131
20. Shapovalov V. I., Komlev A. E., Komlev A. A., Morozova A. A., Lapshin A. E. Method of Determination of
the Energy Band Gap of Oxide Films // Glass Phys. Chem. 2013. V. 39. No. 6. P. 664–666. DOI
10.1134/S1087659613060096.
21. Shapovalov V.I., Morozova A.A., Lapshin A.E. Determination of Optical Constants of Thin Dielectric Films
Using the Spectral Transmission Coefficient // Glass Phys. Chem. 2014. V. 40, No. 3. P. 341–345.
22. Shapovalov V.I., Komlev A.E., Komlev A.A., Morozova A.A. Approximation of the absorption coefficient of
a film under chromogenic effect // Techn. Phys. Lett. 2014. V. 40, No. 6. P. 482–484(DOI)
10.1134/S1063785014060121.
23. Shapovalov V.I., Lapshin A.E., Gagarin A.G., Efimenko L.P. Chemical Composition and Crystal Structure of
Tungsten Oxide Films // Glass Phys. Chem. 2014. V. 40, N. 5. P. 553–569 (DOI)
10.1134/S1087659614050150.
24. Lapshin A.E., Shapovalov V.I., Arsent’ev M.Yu., Komlev A.E., Morozova A.A. Effect of the Heat Treatment
Mode on the Crystal Structure and Optical Properties of Tungsten Oxide // Glass Physics and Chemistry. 2015.
V. 41, No. 6. P. 617–624
25. Lapshin A.E., Shapovalov V.I., Arsent’ev M.Yu., Komlev A.E., Morozova A.A. Effect of the Heat Treatment
Mode on the Crystal Structure and Optical Properties of Tungsten Oxide // Glass Physics and Chemistry. 2015.
V. 41, No. 6. P. 617–624.
26. Levitskii V.S., Shapovalov V.I., Komlev A.E., Zav’yalov A.V., Vit’ko V.V., Komlev A.A., Shutova E.S.
Raman Spectroscopy of Copper Oxide Films Deposited by Reactive Magnetron Sputtering // Techn. Phys.
Lett. 2015. V. 41. P. 1094–1096.
27. Shapovalov V.I., Komlev A.E., Bondarenko A.S., Baykov P.B., Karzin V.V. Substrate heating and cooling
during magnetron sputtering of copper target // Phys. Lett. A. 2016. V. 380, No 7–8. P. 882–885.
28. Lapshin A.E., Karzin V.V., Shapovalov V.I., Baikov P.B. X-ray Phase Analysis of Copper Oxides Films
Obtained by DC Reactive Magnetron Sputtering // Glass Phys. Chem.. 2016. V. 42, No. 1. P. 116–117.
29. Shapovalov V.I., Komlev A.E., Bondarenko A.S., Baykov P.B., Karzin V.V. Substrate heating and cooling
during magnetron sputtering of copper target // Phys. Lett. A. 2016. V. 380, No 7–8. P. 882–885.
30. Shapovalov V. I., Komlev A. E., Vit’ko V. V., Zav’yalov A. V., Lapshin A. E., Moshkalev S. A., Ermakov V.
A. Influence of Annealing on the Optical Properties and Chemical and Phase Compositions of Tungsten-Oxide
Films // J. Sur. Investigat.: X-ray, Synchrotron and Neutron Techniq. 2016. V. 10, No. 5. P. 1077–1086.
31. Lapshin A.E., Levitskii V.S., Shapovalov V.I., Komlev A.E., Shutova E.S., Myl’nikov I.L., Komlev
A.A.Composition and Structure of Copper Oxide Films Synthesized by Reactive Magnetron Sputtering with a
Hot Target // Glass Phys. Chem. 2016. V. 42, No. 4. P. 359–362.
32. Bondarenko A., Kolomiytsev A., Shapovalov V. The target heating influence on the reactive magnetron
sputtering process // J. Phys.: Confer. Series. 2016. V. 729. P. 012006 (3 pages).
33. Babinova R. V., Smirnov V. V., Useenov A. S., Kravchuk K. S., Gladkikh E. V., Shapovalov V. I. Mylnikov I.
L. Mechanical properties of titanium nitride films obtained by reactively sputtering with hot target // J. Phys.:
Confer. Series. 2017. V. 872. P. 012035 (3 pages).
34. Kozin A. A., Shapovalov V. I., Smirnov V. V., Useinov A. S., Kravchuk K. S., Gladkih E. V., Zav’yalov A.
V., Morozova A.A. Influence of technological parameters on the mechanical properties of titanium nitride
films deposited by hot target reactive sputtering // J. Phys.: Confer. Series. 2017. V. 872. P. 012019 (3 pages).
35. Minzhulina E. A., Shapovalov V. I., Smirnov V. V., Zav’aylov A. V., Levitskiy V. S. Thermal processes
during reactive sputtering of hot titanium target // J. Phys.: Confer. Series. 2017. V. 857. P. 012031 (4 pages).
36. Shapovalov V.I. High-power sputtering during film deposition // J. Phys.: Confer. Series. 2017. V. 872. P.
012024 (4 pages).
37. Shapovalov V.I., Karzin V.V., Bondarenko A.S. Physicochemical Model for Reactive Sputtering of Hot Target
// Phys. Lett. A. 2017 V. 381. P. 472–475.
38. Shapovalov V. I., Smirnov V. V. Modelling of hot target reactive sputtering // J. Phys.: Confer. Series. 2017.
V. 857. P. 012039 (4 pages).
39. Lapshin A. E., Shapovalov V. I. , Useinov A. S., Kravchuk K. S., Gladkih E. V., Kozin A. A., Smirnov V. V.
Crystal Structure and mechanical properties of titanium nitride films synthesized by a hot target magnetron //
Glass Phys. Chem.. 2017. V. 43. P. 477–479.
40. Komlev A. A., Minzhulina1 E. A., Smirnov V. V., Shapovalov V. I. Influence of argon pressure and current
density on substrate temperature during magnetron sputtering of hot titanium target // Appl. Phys. A. 2018. V.
124 . P. 48; doi: 10.1007/s00339-017-1458-4.
41. Goncharov A. O., Minzhulina E. A., Shapovalov V. I. Modeling of reactive sputtering of hot titanium target in
nitrogen and oxygen // IOP Conf. Ser.: Mater. Sci. Eng. 2018. V. 387. P. 012020 (4 pages); doi:10.1088/1757-
899X/387/1/012020.
42. Shapovalov V. I., Minzhulina E. A., Smirnov V. V. Current-voltage characteristics of magnetron with hot
target // IOP Conf. Ser.: Mater. Sci. Eng. 2018. V. 387. P. 012069 (4 pages); doi:10.1088/1757-
899X/387/1/012069.
43. Shapovalov V. I., Kozin A. A., Minzhulina E. A., Smirnov V. V. Magnetron with a sputtering unit for
deposition of binary alloy films and solid solutions of two compounds // IOP Conf. Ser.: Mater. Sci. Eng.
2018. V. 387. P. 012070 (4 pages); doi:10.1088/1757-899X/387/1/012070.
44. Shapovalov V. I., Minzhulina E.A. Studying heating of magnetron target based on measurement of substrate
temperature // Vacuum. 2019. V. 161. P. 324–327; https://doi.org/10.1016/j.vacuum.2019.01.001.
45. Kozin A.A., Shapovalov V. I. Modeling of thermal processes in magnetron with single hot target and
sandwich-target // Sur. Coat. Technol. 2019. V. 359. P. 451-458;
https://doi.org/10.1016/j.surfcoat.2018.12.070.
46. Shapovalov V. I. Hot target. Physico-chemical model of reactive sputtering // Technical Physics. 2019. V. 64,
No. 7. P. 926–932; doi: 10.1134/S1063784219070211 (Шаповалов В.И. Горячая мишень. Физико-
химическая модель реактивного распыления // ЖТФ. 2019. Т. 89, вып. 7. С. 990–997; doi:
10.21883/JTF.2019.07.47785.228-18.
47. Шаповалов В.И., Минжулина Е.А, Шестаков Д.С., Искрижицкая Е.Е., Кочин А.В. Реактивное
48. Minzhulina E. A., Shapovalov V. I., Shestakov D. S., Rudakov A. V. Characteristics of magnetron sputtering
of hot titanium target in argon // J. Phys.: Confer. Ser. 2019. V. 1281. P. 01255; doi:10.1088/1742-
6596/1281/1/012055.
49. Shapovalov V. I., Minzhulina E. A., Shestakov D. S., Kochin A. V. Reactive magnetron sputtering of a hot
titanium target in a mixture of argon and nitrogen // J. Phys.: Confer. Ser. 2019. V. 1281. P. 01271;
doi:10.1088/1742-6596/1281/1/012071.
50. Minzhulina E. A., Shapovalov V. I., Aslan N. Shestakov D. S. I-V characteristics of magnetron with hot
titanium target sputtered in argon-oxygen mixture // J. Phys.: Confer. Ser. 2019. V. 1313. P. 012042; doi:
10.1088/1742-6596/1313/1/012042.
51. Shapovalov V. I., Shabalin A. E. I-V characteristics of magnetron with hot target sputtered in three-component
gas mixture // J. Phys.: Confer. Ser. 2019. V. 1313. P. 012048; doi: 10.1088/1742-6596/1313/1/012048.
52. A. A. Kozin, V. I. Shapovalov, H. Ahmedov, A. Demir, B. Korutlu, A. E. Shabalin Study of the effect of argon
pressure on the temperature of a hot target) // J. Phys.: Confer. Ser. 1713 (2020) 012021.
53. A. A. Kozin, V. I. Shapovalov, D. S. Shestakov, A. V. Rudakov, A. E. Shabalin, V. A. Pavlov Magnetron with
sandwich target for solid composite film deposition MoxCr1–xN // J. Phys.: Confer. Ser. 1799 (2021) 012018.
54. V. A. Pavlov, V. I. Shapovalov, D. S. Shestakov, A. V. Rudakov, A. E. Shabalin Time saving technique for
studying thermal processes in magnetron sputtering of titanium target // J. Phys.: Confer. Ser. 1799 (2021) 012021.
55. V.I. Shapovalov, A.V. Zav'yalov, A.A. Meleshko (Morozova), Current-voltage characteristics of a magnetron
with a hot titanium target in chemically active environments, Sur. Coat. Technol. 417 (2021) 127189.
56. D. S. Shestakov, V. I. Shapovalov, A. V. Rudakov, A. E. Shabalin, V. A. Pavlov, Magnetron discharge with
molybdenum target in argon // J. Phys.: Confer. Ser. 1799 (2021) 012031.
57. V.I. Shapovalov, A.V. Zavyalov, A.A. Meleshko (Morozova), Current-voltage characteristics of a magnetron
with a hot titanium target in chemically active environments, Sur. Coat. Technol. 417 (2021) 127189.
58. V.I. Shapovalov, H. Ahmedov, A.A. Kozin, A. Demir, B. Korutlu, Simulation of the effect of argon pressure on
thermal processes in the sputtering unit of a magnetron with a hot target Vacuum 192 (2021) 110421.
59. N. S. Kraynov, A. A. Sharipov, V. I. Shapovalov, Discharge parameters of a magnetron with a molybdenum
target // J. Phys.: Confer. Ser. 1954 (2021) 012023.
60. V. I. Shapovalov Deposition of solid solution films using reactive magnetron sputtering of a sandwich target // J.
Phys.: Confer. Ser. 1954 (2021) 012041.
61. V. I. Shapovalov Effect of vacuum annealing on the optical properties of tungsten oxide films. Thin Solid Films 758 2022 139439, https://doi.org/10.1016/j.tsf.2022.139439 .
62. Viktor I. Shapovalov Physicochemical model for reactive sputtering of a sandwich target, Journal of Applied Physics 133, 085301 (2023); https://doi.org/10.1063/5.0128399.
63. Shapovalov V. I. Modeling of reactive sputtering. History and development», Materials, 2023, 16(8), 3258. https://doi.org/10.3390/ma16083258.