We develop a laser interference lithography (LIL) and nanoimprinting techniques to fabricate nanoscale patterns with arrays of sub-mm-period grating pixel arrays. The LIL system consists of a UV (351 nm) pulsed laser (Nd:YLF AONano 351-3-2-CY, Advanced Optowave Co.), a pair of acousto-optic deflectors (AOD, DTSX-400-405, AA Opto-Electronic Co.), and an XY motorized stage (450 mm x 450 mm, INNO6 Co.). By adjusting the interference angles of q and f with AODs, period (L) and orientation (f) of nanoscale gratings can be precisely defined within the ranges of L = 0.3 mm to 3 mm and f = 0o to 180o. A typical micrograph of squared grating pixels made of photoresist (AZ5206, MicroChemicals) on a silicon wafer shows a grating array of 100 nm-deep parallel corrugations, which have various pairs of L and f but are very uniformly formed within every ~10 mm2 pixel area.