Winner NanoLab Image Contest 2022

I have been trying to establish fabrication protocols for incline lithography. To realize the tripod structures seen in the images, samples coated with 45 um thick negative resist (SU-8) have been exposed through a mask of holes from three separate angles: each exposure cross-linking one leg of the tripods.

Swelling of the resist during the post exposure baking step has caused partial delamination of the interlinked tripod structures. Looking at it, I sometimes experience an optical illusion, where the part of the image I am not looking directly at seems to shift and wave slightly.

Instrument used for imaging: SEM Apreo