Advanced Nano-Scale Fabrication/Engineering for Emerging Electronic Devices
My research vision focuses on developing emerging electronic devices by creating novel functionalities in materials/structures through advanced nano-scale fabrication techniques.
Deposition: Atomic Layer Deposition (ALD), (Co-/Reactive-)Sputtering, (Thermal/E-beam) Evaporation
Etching: RIE, DRIE
Lithography: (Photo-/E-beam) lithography
PEALD Engineering for Functional Metal-Oxide Thin Films
Low-temperature PEALD for Flexible Electronics
Atomic Layer Etching of 2D Materials and Dielectric Film
Remote Epitaxy (NEW)
Graphene Buffer Layer (GBL) Growth
Atomic Layer Lift-Off (ALLO)
MOCVD III-N Remote Epitaxy
Metal-Oxied Electrochemical RAM (ECRAM)
Wafer-scale Remote epitaxy
2D Material-based Layer Transfer (2DLT) for High PPI micro-LED