Classroom: Introduction to MEMS, transducers, markets, information resources, MEMS fabrication processes and materials, bulk micromachining, wet etching, dry etching, surface micromachining, sacrificial layers, film deposition, bonding, sacrificial layers, non-traditional micromachining, introduction to solid state physics, crystal lattices, basic atomic physics, band structure, semiconductors, band structure, doping, p-n junctions

Key topics in biomedical micro-electro-mechanical systems (Bio-MEMS) and micro-integrated systems are covered. Biological concepts related to the BioMEMS are reviewed. Silicon process modules and soft-lithography processes used in the design and fabrication of BioMEMS and micro-integrated systems are presented. Applications of these systems in a variety of sensors and transducers are described. Recent advances in BioMEMS, Lab-on-a-Chip, and related advanced topics are discussed.


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Coverage

This is a project-oriented laboratory course in integrated microsystem design, fabrication, and testing. As system integration levels have increased, more and more different devices are being integrated on a common substrate, creating interesting tradeoffs in system partitioning and technology. To understand these tradeoffs, this course addresses the development of a complete multi-chip microsystem containing sensors, signal processing, and an output interface. This allows us to explore not only a basic MOS device/circuit process, but also to explore processes such as wafer bonding and micromachining that are used for transducers. Microsystems will increasingly be portable devices, emphasizing very low power and making capacitive transducers particularly attractive and important.

The course offers the opportunity to develop a complete integrated microsystem, from inception to final test. Class meetings will be informal and will consist of two 80-minute lecture sessions per week plus one design/fabrication/test session. Students will work in interdisciplinary design teams of typically four people. Each team will design, fabricate, and test two multi-project chips: one using a bulk silicon-on-glass process to realize a number of MEMS transducers, and the other based on a silicon-gate LOCOS E/D NMOS process for signal processing circuitry and additional sensor interface. In order to accomplish this, the course is strongly supported by staff working in Lurie Nanofabrication Facility (LNF) and under the Wireless Integrated MicroSystems (WIMS).

Lab

Student will form a group (three to four students per group) to design both MEMS transducers and E/D NMOS circuits using Coventorware and Cadence CAD tools. All the device designs are simulated before the final layout for fabrication. Once the design is completed, the students will work with an LNF staff to fabricate their own devices. Students will sign up the lab sessions (two students at each session) posted by LNF staff and participate in device fabrication. The bulk of fabrication will be performed by the technical staff of the LNF, and lab sessions will be coordinated for students to work in the lab and carry out some of the process steps on some of the wafers. Student may have an opportunity for basic training and experience on photolithography, etching and metal evaporation.

This book is a recommended (not required) textbook, giving the basis for various microtransducers design and analysis. This text will be supplemented by notes covering sensor technology and fabrication as well as additional information on relevant microstructures.

LEC #TOPICSREADINGS1Introduction to MEMS; microfabrication for MEMS: part IChapters 1 and 22Microfabrication for MEMS: part IIChapters 3 and 43Microfabrication for MEMS: part IIIChapters 3 and 44Microfabrication for MEMS: part IV; in-class fab problemChapters 3 and 55Fabrication for the life sciences; material properties 6Elasticity or electronics IChapters 8 and 147Structures or electronics IIChapters 9 and 148Lumped-element modelingChapter 59Energy-conserving transducersChapter 610Dynamics, especially nonlinearChapter 711Structures special topicsChapter 1012Thermal energy domain; dissipationChapter 1113Modeling dissipative processesChapter 1214Fluids 1Chapter 1315Fluids 2Chapter 1316TransportChapter 1317FeedbackChapter 1518NoiseChapter 1619PackagingChapter 1720In-class design problem 21Design tradeoffs 22Power MEMS case study 23Optical MEMS case studyChapter 2024Capacitive accelerometer case studyChapter 1925BioMEMS case studyChapter 22 Final presentations

Surface micromachined devices are made by alternating layers of polysilicon and a sacrificial layer, such as oxide. To make a mechanical part from the deposited layer material, an underlying sacrificial layer is dissolved, thus freeing the element except where it is retained by an attachment to the silicon surface.

This paper presents the design and fabrication of a Lamb wave device based on ZnO piezoelectric film. The Lamb waves were respectively launched and received by both Al interdigital transducers. In order to reduce the stress of the thin membrane, the ZnO/Al/LTO/Si3N4/Si multilayered thin plate was designed and fabricated. A novel method to obtain the piezoelectric constant of the ZnO film was used. The experimental results for characterizing the wave propagation modes and their frequencies of the Lamb wave device indicated that the measured center frequency of antisymmetric A0 and symmetric S0 modes Lamb wave agree with the theoretical predictions. The mass sensitivity of the MEMS Lamb wave device was also characterized for gravimetric sensing application. be457b7860

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