FIJI ALD

FIJI ALD Recipe (12 04 2023): In the ALD machine, open the folder Zihuan Liu, you can find a recipe with keywords AL2O3_300cycles, this recipe yields around 60 nm Al2O3 layer, but the growth rate is nonlinear. 2000 cycles yielded 200nm.

Each cycle ~= 0.1 nm Al2O3.

The left image is the back side of SOI wafer, the SiO2 has been removed.

The right image is the back side of SOI wafer, with 60nm Al2O3 deposition. It's noticeable that the color became darker.

The two images showed the measured thickness of AL2O3 = 60 nm, using ellipsometer.

this image sets shows the resulting deposition after 700 cycles. The right image shows the front side, and there are some depositions happens around the edge of the front side. It usually won't be a problem because it can be removed with Piranha solution.

Tip: If your process prevents the usage of Piranha, you can use clips to clip a steel plate to protect the front side.

Thickness measurement:

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