Electron beam lithography system


Location: DGIST CCRF, Device Clean Room

Specification:
  • Electron Beam Lithography(EBL) refers to a lithographic process that uses a focused beam of electrons to form the circuit patterns needed for material depositionon (or removal from) the wafer, in contrast with optical lithography which uses light for the same purpose.
  • EBL offers higher patterning resolution than optical lithography because of the shorter wavelength possessed by the dozens of kilometers electron voltage(keV) electrons that it employs.
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