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Greg Doerk
Alumnus - Ph.D. Student

B. S., Chemical Engineering, Case Western Reserve University (2005)
Ph. D., Chemical Engineering, University of California, Berkeley (2010)

Email: 

gsdoerk (at) us.ibm.com

Current Position:


Postdoctoral Researcher
Lithographic Materials
IBM Almaden Research Center
650 Harry Road
San Jose, CA 95120


 
Research:
With the approach of nanoelectromechanical systems (NEMS), the traditional “top down” approaches used for microelectronics and microelectromechanical systems (MEMS) device fabrication become more costly and difficult, making “bottom up” chemical or biological growth approaches increasingly attractive. One classification of novel 1-dimensional nanostructures grown by bottom up techniques that has gained significant attention recently is that of nanowires. Many potential nanophotonic, nanofluidic, and NEMS applications have been envisioned for nanowires, but the realization of these possibilities will demand strict control over nanowire growth. My research was aimed at developing techniques to control nanowire diameter, orientation, and location precisely during their fabrication by combination of top down and bottom up approaches, in order to reproducibly achieve proper device parameters for NEMS applications.