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Calvin DaRosa
Alumnus - Ph.D. Student 

Ph.D. in Chemical Engineering, University of California, Berkeley (2007)
B.S.E. in Chemical Engineering, University of Pennsylvania, (2002)


calvin.darosa (at)

Current Position:

Applications Engineer
One Technology Drive
Milpitas, CA 95035

Catalyst Deposition for Microreactors Using Galvanic Displacement
Selective metal deposition with small features has gained interest for a variety of applications. One such application is in microreactors, where metals are used as catalysts. Galvanic displacement provides a new method for deposition of metal films in microreactors that is selective to silicon and conformal. Since the deposition occurs upon simple immersion of silicon in a plating solution, it is possible to deposit inside silicon microparts, in regions that would not be accessible via line-of-sight methods. 

Advisors: Prof.'s Roya Maboudian and Enrique Iglesia.