Research
Printed Intelligent Materials & Devices (PIMD) LAB
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Printing technique development of Inorganic Materials
Printing technique development of Inorganic Materials
Solution-process based Fabrication of Inorganic Material Films
Solution-process based Fabrication of Inorganic Material Films
(무기물 전자소재용 용액공정 기술개발)
Solution Synthesis for High-performance inorganic materials
: Precursor solution engineering based on precusor ligands, pH, and additives
High Performance Oxide Semiconductors with High Mobility & Low Defect
: n-type oxide semiconductors (InOx, ZnOx, SnOx, IZO, ZTO, IGZO, and IZTO)
: p-type oxide semiconductors (CuOx, NiOx, and SnOx)
High Performance Oxide Insulators with High-k & Low-leakage Current level
: High-k oxide insulators (ZrOx, HfOx, AlOx and their alloys)
High Performance Oxide Conductors with high conductivity and transparency
High Performance Chalcogenide with superior photo-absorbance and photo-carrier transporting performance
Soft-process Technique Development for Printed Inorganic Films
Soft-process Technique Development for Printed Inorganic Films
(무기물 전자소재용 소프트-공정기술 개발)
Low-temperature process
: Fabrication/post-treatment technique and solution engineering
Non-toxic materials (solvents and solutes) and Fabrication Technologies
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