Semiconducting Thin-film Engineering Lab

[STEL]

Schematic of ALD process

Atomic Layer Deposition Process for Future Electronics


Semiconducting layer
- n-type : SnO₂, ZnO, InO₃, ZnSnO, InGaSnO, InSnZnO, SnS₂, MoS₂, ReS₂, ITO
- p-type : SnO, Cu₂O, SnS, SnSe

Metal layer
- Pt, Ru, MoN, TaN, TiN, 

Dielectric layer
- Alumina, Zirconia, Hafnia, Silicon oxide, Silicon nitride

Study on Interface/Surface Chemistry for Developing Sub-10 nm Scaled Devices


Capacitor structure in Hynix 1Gb DRAM

Transfer curve of IZTO TFT

CMOS thin films inverter fabricated
at low temperature (<240℃)

Vertical transistor


Thin Film Transistors and Inverters for Semiconductor/Display Applications


Novel Deposition/Patterning Techniques for 2-D Materials


Cation-regulated trasnformation process for SnS thin films

We are actively looking for highly motivated Graduate Students (M.S./Ph.D.)  and  Undergraduate Interns with various backgrounds (chemical engineering, materials science, physics, chemistry, electrical engineering etc.).

Please contact Prof. In-Hwan Baek (baek@inha.ac.kr) if you are interested in our research areas. 

반도체 공정 및 소자연구, 특히 식각공정에 관심있는 학생분들은 인하대 백인환 교수에게 연락주세요.