ACE Research Group

Our research interests and topics are mostly focused on understanding and controlling surface-driven reaction chemistry; Atomic Layer Deposition (ALD), Atomic Layer Etching (ALE), and Area Selective Deposition (ASD), and practically applying this knowledge to a wide range of problems in semiconductor processing, nano technology, and sustainable and renewable energy.

Ultimately, we aim to achieve Atomic Craft & Engineering (ACE) technologies to place or remove atom-by-atom only onto desired region, allowing formation of atomic-scale building blocks [Link].

If you are interested in becoming a part of our group crews, please feel free to contact us [Link].