Bio: Hsiu-Ming (Sherman) Chang is a yield engineer at Intel Corporation where he is responsible for analyzing the yield-limiting factors for advanced CMOS technology. He received his B.Engr. degree in Electrical and Electronics Engineering (Industrial Education) from National Taiwan Normal University in 2002. He earned masters of science degrees in Electrical Engineering and Management Science and Engineering from Stanford University in 2006, and the Ph.D. degree in Electrical and Computer Engineering from the University of California, Santa Barbara in 2011.